发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a structure of a semiconductor device together with its manufacturing method wherein low power consumption is realized even with a large screen. SOLUTION: A signal wiring 162 or a part of gate wiring 162 is formed from a low-resistant material (typically aluminum), a pixel TFT 206 of a pixel 205 comprises a p-channel type TFT. The p-channel type TFT of the pixel has a multi-gate structure comprising a plurality of channel formation regions 166 and 167 for reducing variation in off current.
申请公布号 JP2002151698(A) 申请公布日期 2002.05.24
申请号 JP20000347205 申请日期 2000.11.14
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;FUJIMOTO ETSUKO;MURAKAMI TOMOHITO;SUZAWA HIDEOMI;ONO KOJI
分类号 G02F1/136;G02F1/1362;G02F1/1368;G09F9/30;H01L21/336;H01L21/77;H01L21/84;H01L27/08;H01L27/12;H01L29/786 主分类号 G02F1/136
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