发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a structure of a semiconductor device together with its manufacturing method wherein low power consumption is realized even with a large screen. SOLUTION: A signal wiring 162 or a part of gate wiring 162 is formed from a low-resistant material (typically aluminum), a pixel TFT 206 of a pixel 205 comprises a p-channel type TFT. The p-channel type TFT of the pixel has a multi-gate structure comprising a plurality of channel formation regions 166 and 167 for reducing variation in off current. |
申请公布号 |
JP2002151698(A) |
申请公布日期 |
2002.05.24 |
申请号 |
JP20000347205 |
申请日期 |
2000.11.14 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;FUJIMOTO ETSUKO;MURAKAMI TOMOHITO;SUZAWA HIDEOMI;ONO KOJI |
分类号 |
G02F1/136;G02F1/1362;G02F1/1368;G09F9/30;H01L21/336;H01L21/77;H01L21/84;H01L27/08;H01L27/12;H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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