发明名称 INTERLATTICE DIFFUSION BARRIER
摘要 PROBLEM TO BE SOLVED: To provide a heterojunction bipolar transistor where the reliability is improved by preventing such a problem that beryllium atoms diffuse from a base to an emitter, and its formation method. SOLUTION: A heterojunction bipolar transistor is doped with phosphor (24) within its sub collector layer (20). The existence of phosphor couples any interlattice gallium with phosphor (24) and shifts the gallium to other lattice section. As a result, the interlattice gallium ceases to diffuse to the base layer, consequently the gallium arranges the beryllium to cease to be replaced and diffused. In place of the doping with phosphor, a layer including phosphor can be used.
申请公布号 JP2002151521(A) 申请公布日期 2002.05.24
申请号 JP20010271266 申请日期 2001.09.07
申请人 TRW INC 发明人 CHIN PATRICK T;GUTIERREZ-AITKEN AUGUSTO L;KANESHIRO ERIC N
分类号 H01L21/22;H01L21/331;H01L29/08;H01L29/207;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L21/22
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