发明名称 |
METHOD FOR PRODUCING FERROELECTRIC CAPACITORS AND INTEGRATED FERROELECTRIC SEMICONDUCTOR MEMORY ARRANGEMENT |
摘要 |
The invention relates to a method for producing a ferroelectric capacitor, especially in large-scale integrated, non-volatile semiconductor memories, and to an integrated ferroelectric semiconductor memory arrangement. In order to prevent damage to the ferro- or paraelectric (6), a TaSixNy barrier layer (7) is deposited over the capacitor module (1). The TaSixNy material has barrier properties in relation to hydrogen diffusion and Ti diffusion. |
申请公布号 |
WO0241339(A2) |
申请公布日期 |
2002.05.23 |
申请号 |
WO2001DE04248 |
申请日期 |
2001.11.13 |
申请人 |
INFINEON TECHNOLOGIES AG;GABRIC, ZVONIMIR;HARTNER, WALTER;KROENKE, MATTHIAS;SCHINDLER, GUENTHER |
发明人 |
GABRIC, ZVONIMIR;HARTNER, WALTER;KROENKE, MATTHIAS;SCHINDLER, GUENTHER |
分类号 |
H01L21/02;H01L21/285;H01L27/115 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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