发明名称 METHOD FOR PRODUCING FERROELECTRIC CAPACITORS AND INTEGRATED FERROELECTRIC SEMICONDUCTOR MEMORY ARRANGEMENT
摘要 The invention relates to a method for producing a ferroelectric capacitor, especially in large-scale integrated, non-volatile semiconductor memories, and to an integrated ferroelectric semiconductor memory arrangement. In order to prevent damage to the ferro- or paraelectric (6), a TaSixNy barrier layer (7) is deposited over the capacitor module (1). The TaSixNy material has barrier properties in relation to hydrogen diffusion and Ti diffusion.
申请公布号 WO0241339(A2) 申请公布日期 2002.05.23
申请号 WO2001DE04248 申请日期 2001.11.13
申请人 INFINEON TECHNOLOGIES AG;GABRIC, ZVONIMIR;HARTNER, WALTER;KROENKE, MATTHIAS;SCHINDLER, GUENTHER 发明人 GABRIC, ZVONIMIR;HARTNER, WALTER;KROENKE, MATTHIAS;SCHINDLER, GUENTHER
分类号 H01L21/02;H01L21/285;H01L27/115 主分类号 H01L21/02
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