SYSTEM AND METHODS FOR LASER ASSISTED DEPOSITION

摘要

Systems and methods for laser assisted deposition use an energy source such as a laser to simultaneously deposit and anneal a thin film of semiconductor or metal material on a substrate. The uniform heating of the deposited material while the layer is being sputtered obviates a subsequent annealing stage. The laser can be pulsed or continuous wave. The substrate can be plastic such as tedlar, mylar, teflon, or tefzel. The systems and methods for laser assisted deposition can be used to manufacture solar cells, such as a cadmium telluride (CdTe) solar cell having a cadmium sulfide (CdS) window layer. Both the techniques of sputtering and sublimation can be used to grow the layer.