发明名称 |
Production of a ferroelectric capacitor used in the production of highly integrated non-volatile storage capacitors, especially FeRAMs, comprises inserting a dielectric between precious metal electrodes |
摘要 |
Production of a ferroelectric capacitor comprises inserting a ferroelectric or para-electric material as dielectric (6) between precious metal electrodes (3, 4) of the capacitor (1); and depositing a TaSixNy layer as hydrogen diffusion barrier (7) over the capacitor to protect the ferroelectric or para-electric material from hydrogen used in the integration process. An Independent claim is also included for a highly integrated non-volatile storage capacitor. Preferred Features: The TaSixNy layer is structured so that it lies between an electrode plate of the capacitor and a Ti/TiN barrier layer in a neighboring through-hole filled with tungsten.
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申请公布号 |
DE10056295(A1) |
申请公布日期 |
2002.05.23 |
申请号 |
DE20001056295 |
申请日期 |
2000.11.14 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
HARTNER, WALTER;GABRIC, ZVONIMIR;KROENKE, MATTHIAS;SCHINDLER, GUENTER |
分类号 |
H01L21/02;H01L21/285;H01L27/115;(IPC1-7):H01L21/823 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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