| 摘要 |
<p>An electron beam exposure system for exposing wafers by electron beams, comprising a wafer-mounted wafer stage, a first electron beam generator for generating exposure electron beams to be applied onto wafers, a mark unit provided on an area other than a wafer-mounted area on the wafer stage, and a second electron beam generator for generating detection electron beams to be applied onto the mark unit.</p> |
