| 摘要 |
<p>The invention concerns a method and a device for depositing thin films. The technical field of the invention is the production of thin-film optical devices. The invention is characterised in that a device (27) for depositing thin films (355, 36) on several substrates (10, 11), comprises means for producing a light beam (31, 31a, 31b, 32a) controlling the optical thickness of the substrates.</p> |
