发明名称 Radiation-emitting semiconductor body used as a light emitting diode comprises a radiation-producing layer sequence and a window layer having one or a number of subsequent aluminum gallium arsenide layers produced by liquid phase epitaxy
摘要 Radiation-emitting semiconductor body (1) comprises a radiation-producing layer sequence (2) and a window layer (3) partially permeable to radiation produced. The window layer has one or a number of subsequent AlGaAs layers (4, 5, 6) produced by liquid phase epitaxy or a similar process. The AlGaAs layers have an Al content which increases in the direction of the layer sequence. An Independent claim is also included for a process for the production of the radiation-emitting semiconductor body comprising preparing an epitaxial substrate, growing AlGaAs layers on the substrate using liquid phase epitaxy, and then growing the radiation-producing layer sequence on the AlGaAs layers using organometal gas phase epitaxy or molecular beam epitaxy. Preferred Features: The AlGaAs layer (6) lying next to the layer sequence has a passivating layer in the transition region to the layer sequence. The transition region has a thickness of 10-30 nm.
申请公布号 DE10056476(A1) 申请公布日期 2002.05.23
申请号 DE2000156476 申请日期 2000.11.15
申请人 OSRAM OPTO SEMICONDUCTORS GMBH & CO. OHG 发明人 LUTGEN, STEPHAN
分类号 H01L21/208;H01L33/00;H01L33/02;H01L33/30;H01S5/16;H01S5/183;(IPC1-7):H01L33/00 主分类号 H01L21/208
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