| 摘要 |
<p>A method and a device for atmospheric plasma processing; the method capable of processing a processed body, comprising the steps of, under a pressure near the atmospheric pressure, installing a fixed dielectric on the opposed surface of at least one of a pair of electrodes opposed to each other, leading processing gas between the pair of opposed electrodes, and applying a field between the electrodes to provide plasma, and allowing the plasma to come into contact with the processed body, characterized in that the processed gas is exhausted from near a processed part for allowing the plasma to come into contact with the processed body, and the area near the processed part is held in a specified gas atmosphere by a gas atmosphere conditioning mechanism.</p> |
