SYSTEM AND METHOD FOR PREDICTING SOFTWARE MODELS USING MATERIAL-CENTRIC PROCESS INSTRUMENTATION

摘要

A system and method for predicting software models used in chemical mechanical polishing (CMP) of workpieces using material-centric process instrumentation. One embodiment is a system which includes a feed forward loop (44) for computing predictive calculations, a feed back loop (46) for computing run-to-run calculations, a historical database (48) which links together the feed forward and feed back loops, and a computational engine (56) used to calculate new or adjusted CMP process parameters.