METHOD FOR MANUFACTURING OBJECTIVE FILM, OBJECTIVE FILM OBTAINED BY THE METHOD, AND LAMINATED STRUCTURE

摘要

A method for manufacturing an objective film excellent in crystallinity at a low cost. In this method, an intermediate layer (2) is epitaxially grown on the upper face of a substrate (1) made of single-crystal silicon. The intermediate layer (2) is made of silicide (MSix), for example. Next, an objective film (3) is epitaxially grown on the upper face of the intermediate layer (2). The objective film (3) is made of crystalline silicon to become a solar cell, for example. Next, the intermediate layer (2) is etched off. As a result, the objective film (3) can be removed from the substrate. The thin film excellent in crystallinity can be manufactured at a low cost and expected for use in production of various devices.