| 发明名称 |
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING TREATMENT OF SUBSTRATE AND APPARATUS FOR TREATMENT OF SUBSTRATE |
| 摘要 |
A method for the treatment of a substrate is disclosed which comprises a step of washing the substrate as immersed in the liquid held in a one-bath type liquid tank, pulling up the substrate from within the liquid tank into the atmosphere of an inert gas, and drying the substrate in the atmosphere of the inert gas.
|
| 申请公布号 |
US2002061647(A1) |
申请公布日期 |
2002.05.23 |
| 申请号 |
US19970928466 |
申请日期 |
1997.09.12 |
| 申请人 |
KAWAMOTO TOMOKAZU;KUZUYA SHINJI |
发明人 |
KAWAMOTO TOMOKAZU;KUZUYA SHINJI |
| 分类号 |
H01L21/677;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H01L21/677 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
