| 摘要 |
<p>The invention concerns a device for injecting gas in a reactor, in particular a fast heat treatment or a chemical vapour deposition installation, comprising a reaction chamber (12) with sealed enclosure (16) provided with a window (18) made of transparent material allowing through an electromagnetic radiation of the infrared and/or ultraviolet type emitted by heating lamps (14, 50). Channels (44, 48) are provided radially at mid-height in a common horizontal plane of the body of the window (18) by being made to communicate with at least a peripheral feeding housing (18) connected to an external gas circuit (34). Blind holes (48) are perforated vertically in the window (18) from the lower surface oriented on the side of the reaction chamber (12) to emerge into the channels (44).</p> |
