发明名称 Polishing agent, method of producing same, and method of polishing
摘要 A polishing agent for polishing a surface of a target object without unduly scratching it includes mother particles and very fine abrading particles which are supported on the surfaces of the mother particles and remain so supported during a polishing process, becoming reattached if removed. Such an agent is produced by adding the mother particles into the abrading particles and stirring them together. In a polishing process, a specified amount of such an agent is supplied onto a lapping plate and a lapping process is carried out while the plate is rotated at a specified rotational speed.
申请公布号 US2002061651(A1) 申请公布日期 2002.05.23
申请号 US20010006977 申请日期 2001.12.04
申请人 NIHON MICROCOATING CO., LTD. 发明人 TANI YASUHIRO;YISHEN LU
分类号 B24B57/02;B24B37/00;B24B37/04;B24D3/34;C09K3/14;H01L21/304;(IPC1-7):H01L21/302;H01L21/461 主分类号 B24B57/02
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