发明名称 |
Polishing agent, method of producing same, and method of polishing |
摘要 |
A polishing agent for polishing a surface of a target object without unduly scratching it includes mother particles and very fine abrading particles which are supported on the surfaces of the mother particles and remain so supported during a polishing process, becoming reattached if removed. Such an agent is produced by adding the mother particles into the abrading particles and stirring them together. In a polishing process, a specified amount of such an agent is supplied onto a lapping plate and a lapping process is carried out while the plate is rotated at a specified rotational speed. |
申请公布号 |
US2002061651(A1) |
申请公布日期 |
2002.05.23 |
申请号 |
US20010006977 |
申请日期 |
2001.12.04 |
申请人 |
NIHON MICROCOATING CO., LTD. |
发明人 |
TANI YASUHIRO;YISHEN LU |
分类号 |
B24B57/02;B24B37/00;B24B37/04;B24D3/34;C09K3/14;H01L21/304;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
B24B57/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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