发明名称 |
METHOD FOR PRODUCING AN EVAPORATION SOURCE |
摘要 |
The invention relates to a method for producing an evaporation source for physical vapour deposition. The evaporation source consists of the actual sputter target, which comprises an aluminium component and one or more additional components and of a back plate of a material with greater thermal conductivity than the target. According to the invention, the back plate is compressed from pulverulent starting material, together with the pulverulent components of the sputter targets in superposed pulverulent layers and is subsequently formed. |
申请公布号 |
WO0240735(A1) |
申请公布日期 |
2002.05.23 |
申请号 |
WO2001AT00349 |
申请日期 |
2001.11.07 |
申请人 |
PLANSEE AKTIENGESELLSCHAFT;WILHARTITZ, PETER;SCHOENAUER, STEFAN;POLCIK, PETER |
发明人 |
WILHARTITZ, PETER;SCHOENAUER, STEFAN;POLCIK, PETER |
分类号 |
B22F3/17;B22F3/14;B22F3/20;B22F7/06;C22C14/00;C23C14/34 |
主分类号 |
B22F3/17 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|