DEVELOPING SOLUTION FOR PHOTORESIST AND METHOD FOR DEVELOPING PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a safe developing solution for photoresist which ensures good resolution and produces few harmful effects on the environment and to provide a method for developing the photoresist. SOLUTION: The developing solution for photoresist contains 80-95% aliphatic hydrocarbon mixture containing >=80% n-heptane and 5-20% monocyclic aromatic hydrocarbon mixture containing >=80% 9C alkylbenzene. The photoresist is developed with the developing solution.