发明名称 PARTICLE MEASURING METHOD AND THIS MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a particle apparatus allowing measurement of particle adhering to a film surface to be executed in an ordinary factory environment and capable of obtaining measurement evaluation result in a short time. SOLUTION: This particle measuring apparatus is at least provided with an illuminating light source 3 for illuminating the film surface in the image photographing direction and in the right-angled direction, a digital image data creating camera 4 for photographing a particle shadow on the film surface on a stage capable of moving in the lateral direction and in the focus direction, and a control and operating computer 10 formed by a ROM memory part 10c for inputting and storing particle image data, a stage control part 10a for controlling the stage, an image input control part 10b for controlling the input of particle image data, a ROM memory part 10e for storing a comparative determination program, a determination result display part 10f for displaying determination result, and a CPU 10d.
申请公布号 JP2002148200(A) 申请公布日期 2002.05.22
申请号 JP20000342824 申请日期 2000.11.10
申请人 TOPPAN PRINTING CO LTD 发明人 YAMAGUCHI MIKIRO;UNO TAKASHI
分类号 G01B11/02;G01N21/892;G06M11/00;(IPC1-7):G01N21/892 主分类号 G01B11/02
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