发明名称 |
LOW-TEMPERATURE DEPOSITION METHOD FOR THIN FILM OF TIN OXIDE |
摘要 |
PROBLEM TO BE SOLVED: To manufacture a thin film of tin oxide with satisfactory film deposition efficiency by a spray thermal decomposition method even at a relatively low substrate temperature ranging from 300 to 500 deg.C by adding hydrogen peroxide as a prooxidant to a tetrabutyltin or tin tetrachloride solution. SOLUTION: The tetrabutyltin or tin tetrachloride solution to which hydrogen peroxide is added as an oxidizer is sprayed onto a preheated substrate to undergo thermal decomposition. After a wait for the recovery of the substrate temperature dropped by the spraying with the raw-material solution, the spraying with the raw-material solution is intermittently repeated to grow the thin film of tin oxide grow on the surface of the substrate. By using the raw- material solution to which fluorine or fluoride is added, the thin film of tin oxide having low electric resistance can be manufactured.
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申请公布号 |
JP2002146536(A) |
申请公布日期 |
2002.05.22 |
申请号 |
JP20000339950 |
申请日期 |
2000.11.08 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY CORP |
发明人 |
KANEKO MASAHARU;OKUYA MASAYUKI |
分类号 |
C01G19/02;C23C16/40;H01L21/28;H01L21/285;(IPC1-7):C23C16/40 |
主分类号 |
C01G19/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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