LOW-TEMPERATURE DEPOSITION METHOD FOR THIN FILM OF TIN OXIDE

摘要

PROBLEM TO BE SOLVED: To manufacture a thin film of tin oxide with satisfactory film deposition efficiency by a spray thermal decomposition method even at a relatively low substrate temperature ranging from 300 to 500 deg.C by adding hydrogen peroxide as a prooxidant to a tetrabutyltin or tin tetrachloride solution. SOLUTION: The tetrabutyltin or tin tetrachloride solution to which hydrogen peroxide is added as an oxidizer is sprayed onto a preheated substrate to undergo thermal decomposition. After a wait for the recovery of the substrate temperature dropped by the spraying with the raw-material solution, the spraying with the raw-material solution is intermittently repeated to grow the thin film of tin oxide grow on the surface of the substrate. By using the raw- material solution to which fluorine or fluoride is added, the thin film of tin oxide having low electric resistance can be manufactured.