LASER BEAM EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a laser beam exposure device which can suppress image unevenness due to an interference phenomenon although the device has simple constitution. SOLUTION: The laser beam L from a laser light source 1 is split by a beam splitter 2 into L1 and L2 which are still linearly polarized, and the laser beam L2 is reflected by a mirror 3 to become parallel to the laser beam L1; and they are converted to a circular polarized state by passing through aλγ/4- wavelength plate 4 and only the laser beam L1 has its rotating direction inverted by passing through aλ/2-wavelength plate 5 and is then converged by an optical system 6. The beams are made to irradiate the same point on a film F as a recording medium through an fθoptical system 7 at specific angles while scanned by an unillustrated polygon mirror and consequently the image unevenness due to the interference phenomenon on a film F having birefringence can effectively be suppressed.