| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device suppressing effect of abnormal discharge on the thickness of a formed film, in a vacuum film-forming method, in which plasma discharge is generated by a high voltage energy source of the processing device on the surface of a belt-like object to be formed with a film, and a thin film is vapor-deposited by flowing, on the surface of this object, a gaseous starting material for the thin film formation. SOLUTION: Depending on the presence or absence of abnormal discharge detected by an abnormal discharge detector 11, the processing conditions to be inputted in their controller 12 are switched to those under abnormal or normal time by a switching device 13.
|
