VACUUM VAPOR DEPOSITION METHOD AND SYSTEM FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition method which is capable of yielding a uniform vapor deposited layer on a material to be deposited by evaporation without being affected by the material for vapor deposition adhered near to an electronic gun and being affected by the vapor of evaporated particles and without requiring excess energy and a system for the same. SOLUTION: The output current and deflecting coil current of the electronic gun 2 are automatically changed with lapse of time by a time corrector 15 in association with the amount of the material 4 for vapor deposition sticking near to the electronic gun 2 with lapse of time, by which the intensity and irradiation position of an electron beam 3 is corrected.