发明名称 PATTERN FORMING METHOD AND PLASMA DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problems that the alignment markers heretofore formed simultaneously with first patterns cannot be referenced in exposing of second patterns and misalignment occurs between the plural patterns because there is no more developing process step for the first patterns when only the material forming process step and the exposing process step are repeated without undergoing the developing process step in the plural photographic process steps and the developing process step is carried out at a time in the final. SOLUTION: The pattern forming method which has the process step of previously forming the alignment markers on a first thick film in a first thick film forming process step and references the alignment markers in the exposing process step of a second thickness film.
申请公布号 JP2002148824(A) 申请公布日期 2002.05.22
申请号 JP20000338669 申请日期 2000.11.07
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HIBINO JUNICHI;MARUNAKA HIDEKI;SUMITA KEISUKE;ASHIDA HIDEKI;OTANI MITSUHIRO;FUJIWARA SHINYA;TONO HIDEYO;NAKAGAWA HITOSHI;KIRIHARA NOBUYUKI;SENHEN MITSUO
分类号 G03F9/00;G03F7/20;H01J9/02;H01J11/22;H01J11/34;(IPC1-7):G03F9/00;H01J11/02 主分类号 G03F9/00
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