发明名称 Adhesive material applying method and apparatus, interconnect substrate, semiconductor device and manufacturing method thereof, circuit board and electronic instrument
摘要 A method of applying an adhesive material comprising the steps of: providing the adhesive material on an interconnect substrate; and pressure-bonding the adhesive material to the interconnect substrate. A base has a plurality of first regions to be punched out and second regions located between the first regions. An interconnect pattern is formed at least in the first regions. Part of the adhesive material located within the first regions is pressurized to flow toward the second regions to move air bubbles to the second regions.
申请公布号 US6391686(B1) 申请公布日期 2002.05.21
申请号 US20000592292 申请日期 2000.06.12
申请人 SEIKO EPSON CORPORATION 发明人 SHIOZAWA MASAKUNI
分类号 H05K3/32;H01L21/60;(IPC1-7):H01L21/44;H01L21/48;H01L21/50 主分类号 H05K3/32
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