| 摘要 |
A method of producing a micro structure on a substrate which has a support portion and a plate-like portion supported thereby at a distance from the substrate, comprising the steps of forming a spacer layer consisting of an insulating material on a substrate having an electrically conductive layer formed on its surface, forming a latent image layer consisting of an electrically conductive material on the spacer layer at a site where the plate-like portion of an intended structure is to be formed, producing an aperture, where a part of the electrically conductive layer is exposed, on the spacer layer at a site where the supporting portion of an intended structure is to be formed, forming a structure layer consisting of plating film inside of the aperture and on the latent image layer by electroplating the electrically conductive layer as a cathode, and removing the spacer layer.
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