| 摘要 |
A microwave plasma treatment apparatus according to the present invention comprises a microwave generating section for generating TE11-mode microwaves, a circular waveguide for propagating the TE11-mode microwaves generated from the microwave generating section, a plasma generating section for generating a plasma by using the TE11-mode microwaves propagated through the circular waveguide, and a treatment chamber for treating an object of treatment with the plasma generated by the plasma generating section. Those inner surface regions of the circular waveguide which are opposed to each other in the electric-field direction of the microwaves are deformed so that the electric-field intensity of the TE11-mode microwaves is substantially uniform in the magnetic-field direction of the microwaves.
|
