发明名称 Semiconductor memory device and method of producing the same
摘要 A semiconductor memory device has access transistors with a gate and a pair of impurity diffusion layers formed on a semiconductor substrate and memory capacitors with a storage node electrode and a cell plate electrode. The electrodes are connected to each other via a capacitive insulating layer made of a ferroelectric material. The storage node electrode has a surface covered with the capacitive insulating layer and is formed in a shape of column on one of the pair of impurity diffusion layers in a hole formed from an inter-layer insulating film covering the access transistor to the one of the pair of impurity diffusion layers. A upper surface of the column does not exceed the inter-layer insulating film. The storage node electrode formed in the hole face the cell plate electrode via the inter-layer insulating film.
申请公布号 US6392264(B2) 申请公布日期 2002.05.21
申请号 US19980110252 申请日期 1998.07.06
申请人 TAKEUCHI HIDEKI;IZUMI HIROHIKO 发明人 TAKEUCHI HIDEKI;IZUMI HIROHIKO
分类号 H01L21/02;H01L21/768;(IPC1-7):H01L29/78;H01L27/108 主分类号 H01L21/02
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