发明名称 Method of making SiC single crystal and apparatus for making SiC single crystal
摘要 An apparatus comprises an Si-disposing section in which solid Si is disposed; a seed-crystal-disposing section in which a seed crystal of SiC is disposed; a synthesis vessel adapted to accommodate the Si-disposing section, the seed-crystal-disposing section, and carbon; heating means adapted to heat the Si-disposing section and the seed-crystal-disposing section; and a control section for transmitting to the heating means a command for heating the Si to an evaporation temperature of Si or higher and heating the seed crystal to a temperature higher than that of Si; wherein the Si evaporated by the heating means is adapted to reach the seed-crystal-disposing section.
申请公布号 US6391109(B2) 申请公布日期 2002.05.21
申请号 US20000750157 申请日期 2000.12.29
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;NISHINO SHIGEHIRO 发明人 SHIOMI HIROMU;NISHINO SHIGEHIRO
分类号 C30B23/00;(IPC1-7):C30B35/00 主分类号 C30B23/00
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