| 摘要 |
A sample table for use in a pattern exposure machine configured to transfer a circuit pattern formed in a mask onto a sample. The sample table is divided into a center part and a peripheral part surrounding the center part. The center part and the peripheral part include a chuck mechanism for attracting the sample, respectively. A portion or the whole of the peripheral part are movable in a radial direction of the sample table in a condition that the sample is attracted to the peripheral part of the sample table. Thus, the invention operates such that when the pattern on the sample has become smaller or larger than a mask pattern, the sample, such as a silicon substrate, is expanded or contracted for a shortened time to obtain a desired.
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