发明名称 |
Solar cell, a method of producing the same and a semiconductor producing apparatus |
摘要 |
In preparing a solar cell, minute projections and recesses are uniformly formed in a surface of a single crystal silicon substrate or a polycrystal silicon substrate by dipping in an etching liquid composed of a mixed acid which is composed mainly of a hydrofluoride acid, a nitric acid and a phosphoric acid in addition to a surface active agent. A solar cell having a substrate in which spherical projections and recesses are formed in a surface of it to which light is incident; an apparatus for producing efficiently a solar cell by realizing the above-mentioned process, and a wet etching apparatus to effect stably the above-mentioned process to thereby maintaining a concentration of a nitric acid to be constant, are provided.
|
申请公布号 |
US6391145(B1) |
申请公布日期 |
2002.05.21 |
申请号 |
US19990285264 |
申请日期 |
1999.04.02 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
NISHIMOTO YOICHIRO;ARIMOTO SATOSHI;NAMBA KEISUKE |
分类号 |
H01L21/306;H01L31/0236;H01L31/04;H01L31/18;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/306 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|