发明名称 Compound semiconductor device having low-resistive ohmic contact electrode and process for producing ohmic electrode
摘要 An indium layer sandwiched between palladium layers are treated with heat so that the indium is diffused into a p-type gallium arsenide, and is alloyed with the palladium, whereby the p-type indium gallium arsenide layer decreases a Schottky barrier between the p-type gallium arsenide and the palladium-indium alloy layer.
申请公布号 US6392262(B1) 申请公布日期 2002.05.21
申请号 US20000491638 申请日期 2000.01.27
申请人 NEC CORPORATION 发明人 SHIRAISHI YASUSHI
分类号 H01L21/285;H01L21/331;H01L21/335;H01L21/822;H01L21/8252;H01L27/06;H01L29/45;(IPC1-7):H01L29/80;H01L31/112 主分类号 H01L21/285
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