发明名称 Aperture for an exposure apparatus for forming a fine pattern on a semiconductor wafer
摘要 An aperture body has a light transmissive region defined therein which includes first, second, third and fourth curved segments. During an exposure process, each curved segment of the light transmissive region contributes to an improved resolution and optimum depth of focus (DOF).
申请公布号 US6391677(B1) 申请公布日期 2002.05.21
申请号 US20000527391 申请日期 2000.03.16
申请人 OKI ELECTRIC INDUSTRY CO., LTD. 发明人 KAMATSUKI ISSEI
分类号 G03F7/20;(IPC1-7):H01L21/00 主分类号 G03F7/20
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