发明名称 |
Aperture for an exposure apparatus for forming a fine pattern on a semiconductor wafer |
摘要 |
An aperture body has a light transmissive region defined therein which includes first, second, third and fourth curved segments. During an exposure process, each curved segment of the light transmissive region contributes to an improved resolution and optimum depth of focus (DOF).
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申请公布号 |
US6391677(B1) |
申请公布日期 |
2002.05.21 |
申请号 |
US20000527391 |
申请日期 |
2000.03.16 |
申请人 |
OKI ELECTRIC INDUSTRY CO., LTD. |
发明人 |
KAMATSUKI ISSEI |
分类号 |
G03F7/20;(IPC1-7):H01L21/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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