| 摘要 |
An electron optical system for controlling an electron beam to write a pattern detects the position of a stage reference mark on a stage using the electron beam, and a wafer stage position detection unit detects the position of the stage. Based on the detection results, the relative position between the electron beam and stage is specified, and pattern writing is controlled in accordance with this relative position. The electron optical system has an electron optical system reference mark. The electron optical system detects the position of this electron optical system reference mark at predetermined time intervals during pattern writing, and the relative position is corrected on the basis of a variation of that position.
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