| 摘要 |
A ferroelectric memory and method for fabricating the same includes a plurality of first gate electrodes and second gate electrodes formed on an active region of a substrate electrically separated form each other, a plurality of first electrodes of first ferroelectric capacitors each connected to the substrate at one side of the first gate electrode, and a plurality of first electrodes of the second ferroelectric capacitors each connected to the substrate at one side of the second gate electrode. Ferroelectric layers respectively formed on the first electrodes, and second electrodes are formed on the ferroelectric layers. A first metal line electrically couples the plurality of first gate electrodes, and a second metal line electrically couples the plurality of second gate electrodes. The ferroelectric memory has a simplified fabrication process and an increased area of the capacitor that is favorable for high density device packing. The first and second metal lines can be the second electrodes of the ferroelectric capacitors.
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