| 摘要 |
PURPOSE:To provide the subject new compound useful as a photoresist material, its raw material, production raw material for various polymeric materials, additive, its production raw material, additive for improving performance of various oily products and its production raw material. CONSTITUTION:The 1,1,1-tris(hydroxycyclohexyl)methanes of formula I (R<1> to R<4>, R<5> to R<8> and R<9> to R<12> are H, halogen, OH, lower alkyl, halogenated lower alkyl, alkoxy or cycloalkyl), e.g. 1,1,1-tris(4-hydroxycyclohexyl)methane. The compound of formula I can be produced by completely hydrogenating the nuclei of a trisphenolic compound of formula II. The compound of formula I enables high-sensitivity photolithography even with short wavelength ray. It is also useful as an additive for improving the properties of various oily products, its production raw material, organic peroxide, etc., production raw material for various organic compound products, etc. |
