发明名称 SEMICONDUCTOR DEVICE HAVING EXPANDED EFFECTIVE WIDTH OF ACTIVE REGION AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A semiconductor device having an expanded effective width of an active region is provided to improve current driving force of a transistor having a small width of an active region by expanding the effective width of the active region so that the width of a channel is increased. CONSTITUTION: A semiconductor substrate(100) is prepared. The semiconductor substrate is selectively etched to form a trench(200). A part of the trench is filled with an isolation layer to expose the upper sidewall(205) of the trench. A gate insulation layer(700) is formed on the upper sidewall of the exposed trench and on the upper surface(105) of the semiconductor substrate adjacent to the trench. A gate electrode(800) is formed on the gate insulation layer.
申请公布号 KR100338783(B1) 申请公布日期 2002.05.18
申请号 KR20000063711 申请日期 2000.10.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, KANG YOON;PARK, JONG WOO
分类号 H01L21/76;H01L21/265;H01L21/336;H01L21/762;H01L21/8242;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L21/76
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