发明名称 |
SEMICONDUCTOR DEVICE HAVING EXPANDED EFFECTIVE WIDTH OF ACTIVE REGION AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor device having an expanded effective width of an active region is provided to improve current driving force of a transistor having a small width of an active region by expanding the effective width of the active region so that the width of a channel is increased. CONSTITUTION: A semiconductor substrate(100) is prepared. The semiconductor substrate is selectively etched to form a trench(200). A part of the trench is filled with an isolation layer to expose the upper sidewall(205) of the trench. A gate insulation layer(700) is formed on the upper sidewall of the exposed trench and on the upper surface(105) of the semiconductor substrate adjacent to the trench. A gate electrode(800) is formed on the gate insulation layer.
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申请公布号 |
KR100338783(B1) |
申请公布日期 |
2002.05.18 |
申请号 |
KR20000063711 |
申请日期 |
2000.10.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, KANG YOON;PARK, JONG WOO |
分类号 |
H01L21/76;H01L21/265;H01L21/336;H01L21/762;H01L21/8242;H01L29/78;(IPC1-7):H01L29/78 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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