| 发明名称 |
METHOD AND DEVICE FOR CLEANING MASK FOR EXPOSURE |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for cleaning a mask for exposure by which a desired wiring pattern can be formed. SOLUTION: A photomask 96 is destaticized by using a destaticizer 120 and the photomask 96 is cleaned by using an adhesive roller 100. Since cleaning of the the photomask 96 and prevention of resticking of dust 102 are performed, fine writing pattern can be formed.</p> |
| 申请公布号 |
JP2002139825(A) |
申请公布日期 |
2002.05.17 |
| 申请号 |
JP20000335975 |
申请日期 |
2000.11.02 |
| 申请人 |
IBIDEN CO LTD |
发明人 |
KAWASAKI YOGO;TSUJIKU SATOSHI |
| 分类号 |
B08B1/04;B08B6/00;B08B7/00;G03F1/82;H05K3/00;(IPC1-7):G03F1/08 |
主分类号 |
B08B1/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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