| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer washing device which surely prevents washing irregularities of a semiconductor wafer at a low cost. SOLUTION: Whenever each silicon wafer W in rotation rotates by a prescribed angle, it falls into plane cut-out portions 13a, 13b of wafer rotation rollers 13, 13 each and thereafter it vertically moves by running on a roller outer circumferential surface, respectively. Through this vibration, bubbles sticking to each silicon wafer W during wafer washing are shaken off. Accordingly, washing irregularities of each silicon wafer W can be surely prevented by inexpensive design modification.
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