发明名称 EQUIPMENT FOR CONTROLLING SYSTEM WHICH USES PLASMA
摘要 PROBLEM TO BE SOLVED: To provide equipment for controlling a plasma system by which change in properties in time can be effectively suppressed even when there is interaction among process parameters. SOLUTION: The controlling equipment is provided with first, second and third communication links 10, 11 and 12 which are connected one another, a plasma state detector 18 which is connected to the first communication link 10, a detector 4 of the state of objects to be treated, a utility detector 14 which detects the state of usage of peripheral units, and several controllers 1, 7, 8 and 9 which are connected to the second communication link 11 and generate control numerical information for controlling the energy to be injected into the plasma controlling system according to the numerical information detected by the plasma state detector 18, the detector 4 of the state of objects to be treated, or the utility detector 14. The controllers 1, 7, 8 and 9 generate the control numerical information by selecting one or several pieces of numerical information which has effects mainly on only specified process properties, and supplies the control numerical information to energy controlling equipment or utility controlling equipment through the third communication link 12.
申请公布号 JP2002141334(A) 申请公布日期 2002.05.17
申请号 JP20000331092 申请日期 2000.10.30
申请人 HITACHI LTD 发明人 SAIKAI MASAHARU;ENAMI HIROMITSU
分类号 H05H1/46;B01J19/08;C23F4/00;H01L21/302;H01L21/3065 主分类号 H05H1/46
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