| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent a pseudo defect due to an alignment defect from being induced in a sample inspection apparatus. SOLUTION: The sample inspection apparatus is provided with a measuring- pattern-data generation part which generates measuring pattern data corresponding to the design pattern of a specimen sample, a design-data generation part which generates design-side data on the basis of the design pattern, a means by which the measuring pattern data and the design-side data are aligned, a means by which the measuring pattern data is compared with the design-side data and a means by which the necessity of the reexecution of an alignment operation is judged on the basis of the output of the comparison means.</p> |
