METHOD FOR MANUFACTURING LOW REFLECTIVE SUBSTRATE, LOW REFLECTIVE SUBSTRATE, TRANSPARENT ELECTRODE SUBSTRATE AND RESISTANCE FILM TYPE TRANSPARENT TOUCH PANEL

摘要

PROBLEM TO BE SOLVED: To form an antireflection layer, having a low refractive index on the surface of a substrate and to provide a low reflective substrate, having high transmittance for visible rays by the method of supersaturation precipitation that the substrate is brought into contact with a silicon oxide supersaturated aqueous solution of hydrosilicofluoric acid to precipitate a silicon dioxide film on the substrate surface. SOLUTION: In the method for manufacturing the low reflective substrate, by specifying film-forming rate of the silicon dioxide film to 20 to 100 nm/h in the process of forming a silicon dioxide film by the method of supersaturation precipitation, so as to control the fluorine content in the silicon dioxide film and to form an antireflection film having <=1.435 of refractive index. The low reflective substrate is manufactured by the above method, a transparent electrode film is formed on the low reflective substrate to obtain a transparent electrode substrate, and the transparent electrode substrate is used for a resistance film type transparent touch panel.