发明名称 |
METHOD AND DEVICE OF LIQUID TREATMENT OF PLATE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To solve the problem that liquid adhered to a plate opposing a plate material is not removed at the time of a gas treatment in a method of treating the material surface by consecutively supplying liquid and gas between the plate material and the plate opposed to it. SOLUTION: The periphery of the opposing plate is heated by imbedding heaters around it, irradiating it by a lamp, supplying heated liquid to it or by other methods to speed up the evaporation of the adhered liquid.
|
申请公布号 |
JP2002141326(A) |
申请公布日期 |
2002.05.17 |
申请号 |
JP20000339145 |
申请日期 |
2000.11.01 |
申请人 |
HITACHI LTD |
发明人 |
SAEKI TOMONORI;TAKAHARA YOICHI;DAIROKU NORIYUKI;TANAKA YUICHIRO;AIUCHI SUSUMU;OKA HITOSHI |
分类号 |
B08B1/04;B08B3/02;B08B3/04;B08B3/08;B08B5/02;H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
B08B1/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|