发明名称 Device for the multi-zone injection of gas into a reactor heated by electromagnetic radiation lamps whilst avoiding any masking of the radiation falling onto the substrate under treatment
摘要 A device for injecting gas into a reactor, comprising a reaction chamber (12) in a sealed enclosure (16) fitted with a window (18) allowing the passage of infrared and/or ultraviolet radiation emitted by heating lamps (14), has some channels (44) arranged radially at mid-height in the same horizontal plane as the body of the window and in communication with at least one peripheral feed casing (38) connected to an external gas circuit (34). Some recessed holes (48) are pierced vertically in the window from the inner face oriented to the side of the reaction chamber emerging in the channels. An Independent claim is also included for a rapid temperature processing or chemical vapour phase deposition reactor heated by infrared and/or ultraviolet lamps incorporating this device for the multi-zone injection of gas.
申请公布号 FR2816520(A1) 申请公布日期 2002.05.17
申请号 FR20000014726 申请日期 2000.11.15
申请人 JOINT INDUSTRIAL PROCESSORS FOR ELECTRONICS 发明人 LAPORTE FRANCK;DUCRET RENE PIERRE;GUILLON HERVE;SEMMACHE BACHIR;NOEL SEBASTIEN
分类号 C23C16/44;C23C16/455;C23C16/48;H01L21/00 主分类号 C23C16/44
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