发明名称 |
PHOTOELECTRIC CONVERSION DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To enhance the quality of a photoelectric conversion layer deposited on a silicon thin film and to improve the performance of a photoelectric conversion device by controlling the spin density in this silicon thin film which is a seed layer formed by a plasma CVD method or the like. SOLUTION: A photoelectric conversion device is provided in a structure that a crystalline silicon thin film 3 which contains conductivity decision impurity atoms of a means concentration of 1×1018 to 1×1022 piece/cm3, a photoelectric conversion layer 4 and a semiconductor layer 5 of a conductivity reverse to that of the thin film 3 are provided on a substrate 1 by laminating the layers 3, 4 and 5 on the substrate 1 with electrodes 2 and 6 respectively connected to the thin film 3 and the layer 5. This device is characterized in that the spin density analyzed by an electron spin resonance method in the thin film 3 is 1×1018 piece/cm3 or lower.</p> |
申请公布号 |
JP2002141528(A) |
申请公布日期 |
2002.05.17 |
申请号 |
JP20000331414 |
申请日期 |
2000.10.30 |
申请人 |
KYOCERA CORP |
发明人 |
SHIROMA HIDEKI;SHINRAKU KOUICHIROU;SENDA HIROFUMI |
分类号 |
C23C16/24;H01L21/205;H01L31/04;(IPC1-7):H01L31/04 |
主分类号 |
C23C16/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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