发明名称 |
MANUFACTURING METHOD FOR MULTI-LAYERED COPPER PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a multi-layered copper plate which can efficiently etch away projecting copper around and in a small- diameter hole of the multi-layered copper plate and make external layer copper foil thin by etching. SOLUTION: The projection copper around and in the small-diameter hole is etched away by using a solution containing 0.5 to 10 wt.% hydrogen peroxide, 1 to 15 wt.% sulfuric acid, at least one of 0.001 to 1 wt.% tetrasol and a tetrasol derivative, and 0.005 to 0.5 wt.% phenyl uric acid at need. The surface of the copper foil is uniformly etched to make the copper thin. |
申请公布号 |
JP2002141666(A) |
申请公布日期 |
2002.05.17 |
申请号 |
JP20000333694 |
申请日期 |
2000.10.31 |
申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
ISHIZUKA KOICHI;KOGURE NAOKI;KATO SADAHIRO;SOTOAKA RYUJI;ISHIHARA FUKUSABURO;KAWAMURA TOSHIMITSU |
分类号 |
C23F1/18;H05K3/26;H05K3/42;H05K3/46;(IPC1-7):H05K3/46 |
主分类号 |
C23F1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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