发明名称 MANUFACTURING METHOD FOR MULTI-LAYERED COPPER PLATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a multi-layered copper plate which can efficiently etch away projecting copper around and in a small- diameter hole of the multi-layered copper plate and make external layer copper foil thin by etching. SOLUTION: The projection copper around and in the small-diameter hole is etched away by using a solution containing 0.5 to 10 wt.% hydrogen peroxide, 1 to 15 wt.% sulfuric acid, at least one of 0.001 to 1 wt.% tetrasol and a tetrasol derivative, and 0.005 to 0.5 wt.% phenyl uric acid at need. The surface of the copper foil is uniformly etched to make the copper thin.
申请公布号 JP2002141666(A) 申请公布日期 2002.05.17
申请号 JP20000333694 申请日期 2000.10.31
申请人 MITSUBISHI GAS CHEM CO INC 发明人 ISHIZUKA KOICHI;KOGURE NAOKI;KATO SADAHIRO;SOTOAKA RYUJI;ISHIHARA FUKUSABURO;KAWAMURA TOSHIMITSU
分类号 C23F1/18;H05K3/26;H05K3/42;H05K3/46;(IPC1-7):H05K3/46 主分类号 C23F1/18
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