PHOTORESIST COMPOSITION, PHOTORESIST PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To enhance the resolution and contrast of the L/S pattern of a photoresist pattern. SOLUTION: When a photoresist composition to which a crosslinker of formula (1) or (2) has been added is used, the flow characteristics of a resist are improved and the resolution and contrast of an L/S pattern can be enhanced.