| 摘要 |
PROBLEM TO BE SOLVED: To provide a removal liquid for removing a photoresist of a substrate edge part having superior cleaning and removed ability and high safety to human body at a low cost, while build up phenomenon of a photoresist edge part and a skirt length phenomenon after an edge rinse process of a substrate fringing part can be reduced. SOLUTION: Removal liquid for removing unwanted photoresist adhered to a substrate edge part has a composition is composed of 1-methoxy-2-propanol and 3-methoxy-1-propanol, while the blending quantity of 3-methoxy-1-propanol is 0.03 to 0.15 percent by weight with respect to the total quantity of the removal liquid. |
