发明名称 ELECTRON BEAM DEVICE AND MANUFACTURING METHOD OF DEVICE USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide an electron beam device in which multiple emitters are made applicable by selecting only the emitters, which can emit multiple beams, from a number of emitters. SOLUTION: For the electron beam device 1 which detects a secondary emission of electron emitted from a sample and estimates the surface the sample by irradiating multiple beams emitted from an array of emitters arranged at least two dimensionally, a voltage is selectively applied on each emitter 112 through a terminal by connecting the terminal corresponding to each emitter of the emitter array, and the voltage is applied only on the emitters fulfilling performance as multiple beams, and the only electron beams emitted from the above emitters are utilized.</p>
申请公布号 JP2002141009(A) 申请公布日期 2002.05.17
申请号 JP20000335838 申请日期 2000.11.02
申请人 NIKON CORP;EBARA CORP 发明人 HAMASHIMA MUNEKI;NAKASUJI MAMORU;NOMICHI SHINJI;SATAKE TORU
分类号 G01N23/225;G21K5/04;H01J37/05;H01J37/06;H01J37/28;H01L21/66;(IPC1-7):H01J37/06 主分类号 G01N23/225
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