POSITIVE TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type photosensitive composition having diminished stationary waves, superior sensitivity and resolving power and an excellent shape of a pattern profile. SOLUTION: The positive type photosensitive composition contains a compound which generates an acid when irradiated with active light or radiation, a resin having an alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased by decomposition by the action of the acid and a fluorine-containing compound of formula (I) (where R is a fluorine- containing hydrocarbon group and X is a fluorine-free divalent linking group).