发明名称 METHOD FOR MANUFACTURING LIGHT DIFFUSING LAYER
摘要 PROBLEM TO BE SOLVED: To obtain an inner diffusion layer in which most of recessed grooves are asymmetric. SOLUTION: A control means 10 for the transmittance of light is disposed in the exitation light side of a condenser lens 6 in a batch type proximity gap exposure device 1, so that the energy distribution of the light passing through the aperture of a photomask 7 and irradiating a photosensitive resin 9 is made to deviate.
申请公布号 JP2002139606(A) 申请公布日期 2002.05.17
申请号 JP20000332172 申请日期 2000.10.31
申请人 OPTREX CORP 发明人 IGUCHI SHINSUKE
分类号 G02B5/02;G02F1/1335 主分类号 G02B5/02
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