| 摘要 |
PURPOSE: A multi-channel chemical supply apparatus and a method for the same are provided to supply simultaneously a plurality of chemical by using a quantitative supply device. CONSTITUTION: Chemicals A, B, and C are supplied from a wafer etching chemical storage tank to one bath(BATH1) through each supply path(Pa,Pb,Pc). Each flow sensor(Sa,Sb,Sc) is installed at each supply tube(Pa,Pb,Pc). A multitude of valves(Va1,Va2),(Vb1,Vb2),(Vc1,Vc2) is installed at a multitude of lower branch tube(Pa1,Pa2),(Pb1,Pb2),(Pc1,Pc2) connected each supply path to the bath(BATH1), respectively. Outputs of the flow sensors(Sa,Sb,Sc) are applied to a signal input stage of a quantitative supply portion(100). The valves(Va1,Va2),(Vb1,Vb2),(Vc1,Vc2) are connected with a control signal output stage of the quantitative supply portion(100).
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